Patente

Titel	Method for producing optically planar surfaces for micro-electromechanical system devices
Anmelder	Eastman Kodak Company (Rochester, NY)
Erfinder	Jech, Jr.; Joseph (Rochester, NY); Lebens; John A. (Rush, NY); Brazas, Jr.; John C. (Hilton, NY); Kowarz; Marek W. (Rochester, NY)
Veröffentlichungsdatum	30.07.2000
Land	USA
Abstract	A method for producing optically planar surfaces for micro-electromechanical system devices (MEMS), comprising the steps of: depositing a first layer over a substrate; forming a channel in the first layer wherein the channel has a depth defined by a thickness of the first layer and a width greater than 10 microns; depositing a second layer over the first layer wherein the second layer has a thickness greater than the depth of the channel and is composed of a different material than the first layer; removing the second layer from outside the channel leaving an overlap at the edge of the channel; and polishing the second layer that fills the channel to obtain an optically planar surface for the MEMS device.
Patent-Nr.	US-Patent-Nr.: 6,426,237
IPC-Hauptklasse	H01L 21/30
Quelle	United States Trademark and Patent Office